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|EVG®620 Semi-automated NIL System|
For pattern creation in UV-curable materials from a prestructured stamp to a substrate.
The EVG620 allows for imprint processes with stamps to substrates ranging from small chip size pieces up to 150 mm in diameter. Configurations for nanotechnology applications can include release mechanisms for stamps in addition to programmable high and low contact force. Uniform contact force for high yield large area printing is provided by an EV Group proprietary chuck design which supports both soft and hard stamps.
* Nanoimprint lithography and micro contact printing
* UV light exposure
* Dedicated tooling for UV-NIL
* Accommodation of both soft and hard stamps
* Type of substrates: Si, glass, compound semiconductors