Warning: mysql_connect(): Headers and client library minor version mismatch. Headers:100029 Library:50552 in /data/NANOTECH/wap/inc/SQLclient.inc.php on line 64
|EVG®6200 Semi-automated NIL System|
For pattern creation in UV-curable materials from a prestructured stamp to a substrate.
The EVG6200 Infinity is the culmination of the new aligner-technology roadmap of EV Group. A variety of stamps and substrates sizes from 75mm-to-200mm can be accommodated on the EVG6200 Infinity for nanoimprint lithography applications.
* Nanoimprint lithography and micro contact printing
* UV light exposure
* Dedicated tooling for UV-NIL
* Accommodation of both soft and hard stamps
* Type of substrates: Si, glass, compound semiconductors