Warning: mysql_connect(): Headers and client library minor version mismatch. Headers:100029 Library:50552 in /data/NANOTECH/wap/inc/SQLclient.inc.php on line 64
|DWL 8000 - ADVANCED LARGE AREA 2D AND 3D EXPOSURE SYSTEM |
The DWL 8000 series is a line of advanced large area laser pattern generators ideal for patterning demanding 2D and 3D micro structures in the fields of micro optics, MEMS, displays and sensors. Years of experience in gray scale exposure technology on our smaller systems has enabled us to effectively incorporate this method into the large area DWL 8000 systems. This technique will remove gray scale photomasks from the process equation, reducing cost and greatly improving prototype lead times. More importantly, the gray scale exposure profile can be easily and quickly modified. After a chemical etching process of the photoresist, the 3D arrays can be transferred into other materials by replication, etching or nickel electroforming for embossing or injection molding. In addition to its 3D lithography capability, the DWL 8000 can also be used for binary exposure enabling medium volume production of large area photomasks.
Heidelberg Instruments Mikrotechnik GmbH
69126 Heidelberg (Germany)