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|DWL 4000 - THE ADVANCED LASER PATTERN GENERATOR FOR HIGH RESOLUTION PHOTOMASKS|
The DWL 4000 line of laser lithography systems is an ideal solution to cost effective, high resolution, mask and wafer patterning up to 400 mm x 400 mm. The DWL 4000 systems are utilized in a variety of applications that require complex micro-structures, such as: MEMS, SAW Devices, ASICS, MCMs, Integrated Optics and Displays. The DWL 4000 line consists of two models, the DWL 4000DD and the higher throughput DWL 4000FBM. Besides 2D patterns used in common applications requiring binary exposure, the new DWL 4000 systems can also create complex 3D structures, such as micro-optics, using a cutting edge gray scale exposure technology.
Heidelberg Instruments Mikrotechnik GmbH
69126 Heidelberg (Germany)